Surface Stress during Plasma Oxidation and following Nitridation.
نویسندگان
چکیده
منابع مشابه
Plasma-assisted oxidation, anodization, and nitridation of silicon
Plasma-assisted oxidation, anodization, and nitridation of silicon have been performed in microwave, rf, and dc plasmas with a variety of reactor configurations and a range of plasma densities. Compared to thermal processes at equivalent substrate temperatures, film growth rates are accelerated by the plasma-enhanced generation of reactive chemical species or by the presence of electric fields ...
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ژورنال
عنوان ژورنال: SHINKU
سال: 2002
ISSN: 0559-8516,1880-9413
DOI: 10.3131/jvsj.45.127